Reducing the width of the groove, the injection current is significantly reduced. When the width is reduced from 30 mm to 10 mm, the injection current at the bottom of the groove is at skV. The 37mA is reduced to about 100gmA, a 4 fold reduction. This shows that for narrow and deep grooves or blind holes, the corresponding ion implantation is negligible. A groove with a width of 60 mm cannot apply a pulse voltage higher than skV, and a high pulse voltage will cause an arc discharge, indicating that a hollow cathode effect occurs inside the groove.

The same experiment with the influence of the injected current can be found that the distribution law of the injected current along the side and the effect of the dimensional change on the injected current, that is, as the distance from the bottom increases, the plasma density increases, and the sheath expands when the expansion speed decreases Slow, increase injection current. The change law brought about by the width change is the same as the bottom.

The injection current changes with the injection voltage and the shape of the groove, and it can be seen that the injection t is not uniform at each part of the groove-shaped part during plasma ion implantation, and the injection t is large at the top and the outer part of the groove, and on the side As the depth increases, the implant t decreases, the minimum implant dose at the bottom, and the width-to-depth ratio of the groove decreases, and this difference will be more pronounced.

in conclusion

(1) When plasma source ion implantation and deposition are performed on the groove shape using a metal plasma source, the plasma density distribution in the groove is linearly attenuated as the groove depth increases.

(2) In the short period of time after the high-voltage pulse is applied, the plasma sheath surrounds the workpiece and the profile injection can be realized. However, as the time goes by, the sheath in the groove is quickly superposed, resulting in the lack of ions inside the groove. Sheath expansion accelerates.

(3) The unevenness of the ion implanting agent l inside the groove-shaped part is manifested in that the top is the largest, the side decreases as the depth increases, the bottom is the smallest, the reduction of the groove width and the increase of depth will cause the inhomogeneity to increase.

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